Exploring the Limits of Vacuum Casting Technique for Micron and Submicron Features - l'unam - université nantes angers le mans Accéder directement au contenu
Communication Dans Un Congrès Année : 2004

Exploring the Limits of Vacuum Casting Technique for Micron and Submicron Features

Résumé

A study of resolution limits in standard rapid prototyping vacuum cast molding processes and adaptation of this technique to reach subm icron accuracy is proposed. Micro-fabrication technologies are used to fabricate micron a nd submicron high aspect-ratio patterns on the original parts. The molding of the original part s is optimized to allow replication of submicron features. In carefully exploring materials a nd surface treatments, cast parts are successfully replicated with submicron and high aspect ratio micron structures. These encouraging results enable the use of such processes for micro- and nano-systems applications and open the door to development and production of low cost, high resolution biochips.

Domaines

Electronique
Fichier non déposé

Dates et versions

hal-00986465 , version 1 (02-05-2014)

Identifiants

  • HAL Id : hal-00986465 , version 1

Citer

Matthieu Denoual, Pascal Mognol, Bruno Le Pioufle. Exploring the Limits of Vacuum Casting Technique for Micron and Submicron Features. Proc. of Solid Freeform Symposium, 2004, United States. pp 1-9. ⟨hal-00986465⟩
205 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More